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NITRIDE SEMICONDUCTOR LASER AND NITRIDE SEMICONDUCTOR LASER DEVICE

机译:氮化物半导体激光器和氮化物半导体激光器设备

摘要

A nitride semiconductor laser (1) includes: a first nitride semiconductor layer (20); a light-emitting layer (30) formed on the first nitride semiconductor layer (20) and including a nitride semiconductor; a second nitride semiconductor layer (40) formed on the light-emitting layer (30) and having a ridge portion (40a); an electrode component (50) formed on the second nitride semiconductor layer (40), and which is wider than the ridge portion (40a); and a dielectric layer (60) formed on side surfaces of the ridge portion (40a) and including SiO 2 . A space (70) is present between the electrode component (50) and the dielectric layer (60), and the electrode component (50) is prevented from being in contact with the dielectric layer (60) by the space (70), and is in contact with the upper surface of the ridge portion (40a).
机译:氮化物半导体激光器(1)包括:第一氮化物半导体层(20);和第一氮化物半导体层(20)。在第一氮化物半导体层(20)上形成并包括氮化物半导体的发光层(30);第二氮化物半导体层(40)形成在发光层(30)上并具有脊部(40a);电极部件(50)形成在第二氮化物半导体层(40)上,并且比脊部(40a)宽。介电层(60)形成在脊部(40a)的侧面上并包含SiO 2。在电极部件(50)与电介质层(60)之间存在空间(70),通过该空间(70)防止电极部件(50)与电介质层(60)接触。与脊部(40a)的上表面接触。

著录项

  • 公开/公告号EP3487016A4

    专利类型

  • 公开/公告日2019-09-04

    原文格式PDF

  • 申请/专利权人 PANASONIC CORPORATION;

    申请/专利号EP20170827419

  • 申请日2017-06-28

  • 分类号H01S5/022;H01S5/042;H01S5/22;H01S5/343;

  • 国家 EP

  • 入库时间 2022-08-21 12:29:24

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