首页> 外国专利> METHOD FOR FORMING PATTERN ON LATERAL EPITAXIAL THIN FILM BY SELF-ALIGNMENT, AND PREPARING EPITAXIAL MATERIAL

METHOD FOR FORMING PATTERN ON LATERAL EPITAXIAL THIN FILM BY SELF-ALIGNMENT, AND PREPARING EPITAXIAL MATERIAL

机译:通过自对准在侧向薄膜上形成图案并制备表面材料的方法

摘要

The present disclosure provides a method for forming a pattern on a lateral epitaxial thin film by self-alignment, comprising: preparing a patterned substrate; preparing, on the patterned substrate, a surface-merged lateral epitaxial thin film by means of laterally epitaxially merged growth; and performing exposure treatment on the back of the patterned substrate, and forming a pattern on the lateral epitaxial thin film by self-alignment.
机译:本公开提供了一种通过自对准在横向外延薄膜上形成图案的方法,包括:制备图案化的基板;在所述图案化基板上,通过横向外延合并生长制备表面合并的横向外延薄膜;在图案化基板的背面进行曝光处理,并通过自对准在横向外延薄膜上形成图案。

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