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Epitaxial Growth of Orthorhombic GaFeO3 Thin Films on SrTiO3 (111) Substrates by Simple Sol-Gel Method

机译:简单Sol-Gel法在SrTiO3(111)衬底上正交生长GaFeO3薄膜的外延生长

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摘要

A Sol-gel method assisted with spin-coating has been successfully used to grow orthorhombic GaFeO3 epitaxial films on SrTiO3 (111) substrates for the first time. The film with Pna21 crystal structure has been grown along the c-axis. The rocking curve of (004) reflection shows that the Full-Width at Half-Maximum (FWHM) value could be determined to be 0.230°, indicating good single crystallinity and high quality. X-ray Φ scan reveals a three-fold symmetry of the substrate and a six-fold symmetry of the film, respectively. The in-plane domains rotate 60° from each other in the film. Uniform film with dense structure, columnar grains with similar grain size was obtained. The thickness of the film was evaluated to be ~170 nm. The roughness value (RMS) measured by AFM was 4.5 nm, revealing a flat film. The in-plane Magnetization versus Magnetic field (M-H) curve at 5 K performs a typical ferri- or ferromagnetic hysteresis loop with a saturated magnetization (Ms) value of 136 emu/cm3. The Curie temperature could be determined to be 174 K. Compared to Pulsed Laser Deposition (PLD), the sol-gel method can prepare large area films with low cost. These new films show promising applications in multiferroic devices.
机译:辅助旋涂的Sol-gel方法已成功地首次用于在SrTiO3(111)衬底上生长正交晶GaFeO3外延膜。具有Pna21晶体结构的薄膜已沿c轴生长。 (004)反射的摇摆曲线表明,最大半峰宽(FWHM)值可以确定为0.230°,表明良好的单晶性和高质量。 X射线Φ扫描分别显示基材的三倍对称性和薄膜的六倍对称性。平面内的畴在膜中彼此旋转60°。得到具有致密结构的均匀膜,具有相似晶粒尺寸的柱状晶粒。膜的厚度估计为〜170nm。通过AFM测量的粗糙度值(RMS)为4.5nm,显示出平坦的膜。 5 K时的平面内磁化强度与磁场(M-H)曲线表现出典型的亚铁磁或铁磁磁滞回线,其饱和磁化(Ms)值为136 emu / cm 3 。居里温度可以确定为174K。与脉冲激光沉积(PLD)相比,溶胶-凝胶法可以低成本制备大面积薄膜。这些新膜在多铁性器件中显示出广阔的应用前景。

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