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Epitaxial Growth of Orthorhombic GaFeO3 Thin Films on SrTiO3 (111) Substrates by Simple Sol-Gel Method

机译:通过简单的溶胶 - 凝胶法在SRTIO3(111)衬底上的正交生长正交生长

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摘要

A Sol-gel method assisted with spin-coating has been successfully used to grow orthorhombic GaFeO3 epitaxial films on SrTiO3 (111) substrates for the first time. The film with Pna21 crystal structure has been grown along the c-axis. The rocking curve of (004) reflection shows that the Full-Width at Half-Maximum (FWHM) value could be determined to be 0.230°, indicating good single crystallinity and high quality. X-ray Φ scan reveals a three-fold symmetry of the substrate and a six-fold symmetry of the film, respectively. The in-plane domains rotate 60° from each other in the film. Uniform film with dense structure, columnar grains with similar grain size was obtained. The thickness of the film was evaluated to be ~170 nm. The roughness value (RMS) measured by AFM was 4.5 nm, revealing a flat film. The in-plane Magnetization versus Magnetic field (M-H) curve at 5 K performs a typical ferri- or ferromagnetic hysteresis loop with a saturated magnetization (Ms) value of 136 emu/cm3. The Curie temperature could be determined to be 174 K. Compared to Pulsed Laser Deposition (PLD), the sol-gel method can prepare large area films with low cost. These new films show promising applications in multiferroic devices.
机译:辅助旋涂的溶胶 - 凝胶法已成功地用于首次在SRTIO3(111)底物上生长正交Gafeo3外延薄膜。具有PNA21晶体结构的膜已经沿着C轴生长。 (004)反射的摇摆曲线表明,半最大(FWHM)值的全宽可以确定为0.230°,表明良好的单晶性和高质量。 X射线φ扫描分别显示出基材的三倍对称性和膜的六倍对称性。平面域在薄膜中彼此彼此旋转60°。获得致密结构的均匀薄膜,获得具有相似晶粒尺寸的柱状晶粒。评价薄膜的厚度为约170nm。 AFM测量的粗糙度值(RMS)为4.5nm,露出平膜。平面内磁化与磁场(M-H)曲线为5 k执行典型的铁磁或铁磁磁滞回路,其具有饱和磁化(MS)值为136 emu / cm3。居里温度可以确定为174k。与脉冲激光沉积(PLD)相比,溶胶 - 凝胶法可以制备具有低成本的大面积膜。这些新电影显示了在多体设备中的有希望的应用。

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