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Optimal filtering versus regularization methods in the Fourierprecompensation based proximity neurocorrection in electron beam lithography

机译：电子束光刻中基于傅里叶预补偿的邻近神经校正中的最佳滤波与正则化方法

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Jedrasik P.; García J.; Boeck de B.; Dyck Van D.;
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年度 1998
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正文语种 eng
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1. Dose regularization via filtering and projection: An open-source code for optimization-based proximity-effect-correction for nanoscale lithography [J] . Eriksen Emil H., Nazir Adnan, Balling Peter, Microelectronic Engineering . 2018,第NOVa期

机译：通过过滤和投影进行剂量正则化：用于基于优化的纳米级光刻近距离效应校正的开源代码
2. Progress in proximity electron lithography: demonstration of print and overlay performance using the low-energy electron beam proximity-projection lithography β tool [J] . Shinji Omori, Shinichiro Nohdo, Shoji Nohama, Journal of Microlithography, Microfabrication, and Microsystems. (JM3) . 2004,第3期

机译：邻近电子光刻技术的进展：使用低能电子束邻近投影光刻技术β的打印和覆盖性能演示
3. Progress in proximity electron lithography: demonstration of print and overlay performance using the low-energy electron beam proximity-projection lithography β tool [J] . Shinji Omori, Shinichiro Nohdo, Shoji Nohama, Journal of Microlithography, Microfabrication, and Microsystems. (JM3) . 2004,第3期

机译：邻近电子光刻技术的进展：使用低能电子束邻近投影光刻技术β的打印和覆盖性能演示
4. Application of an electron-beam scattering parameter extraction method for proximity correction in direct-write electron-beam lithography [C] . Author(s): Rudolf M. Weiss Etec Systems Inc. Hayward CA USA, Robert M. Sills Etec Systems Inc. Hayward CA USA. Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing . 1991

机译：电子束散射参数提取方法在直写式电子束光刻中的邻近校正中的应用
5. Computer visualisation and proximity effect correction for submicron electron beam lithography [D] . Gurung, Raju. 1995

机译：亚微米电子束光刻的计算机可视化和邻近效应校正
6. Comparative study of plasmonic antennas fabricated by electron beam and focused ion beam lithography [O] . Michal Horák, Kristýna Bukvišová, Vojtěch Švarc, -1

机译：电子束与聚焦离子束光刻技术制备的等离激元天线的比较研究
7. Optimal filtering versus regularization methods in the Fourier precompensation based proximity neurocorrection in Electron Beam Lithography. [O] . P. Jedrasik, J. Garcia, B. De Boeck, 2007

机译：电子束光刻中基于傅立叶预补偿的近似神经校正的最优滤波与正则化方法。
8. Ionenstrahllithographie: Entwicklung Eines 1:1 Proximity Projektionsverfahrens Auf der Basis von Channeling-Masken (Ion Beam Lithography: Development of a 1:1 Proximity Projection Method Based on Channeling Masks) [R] . Csepregi, L. 1986

机译：Ionenstrahllithographie：Entwicklung Eines 1：1 proximity projektionsverfahrens auf der Basis von Channeling-masken（离子束光刻：开发基于通道掩模的1：1接近投影方法）

Optimal filtering versus regularization methods in the Fourierprecompensation based proximity neurocorrection in electron beam lithography

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