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首页> 外文期刊>Microelectronic Engineering >Dose regularization via filtering and projection: An open-source code for optimization-based proximity-effect-correction for nanoscale lithography
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Dose regularization via filtering and projection: An open-source code for optimization-based proximity-effect-correction for nanoscale lithography

机译:通过过滤和投影进行剂量正则化:用于基于优化的纳米级光刻近距离效应校正的开源代码

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摘要

A new method for dose regularization in optimization-based proximity-effect-correction is proposed. In contrast to the commonly adopted approach of adding penalty terms to the objective function, a modified scheme is demonstrated where dose regularization is achieved via filtering and projection techniques.
机译:提出了一种基于优化的邻近效应校正中剂量正则化的新方法。与通常将惩罚项添加到目标函数的方法相反,演示了一种修改方案,其中通过滤波和投影技术实现了剂量正则化。

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