首页> 外文OA文献 >Optimal filtering versus regularization methods in the Fourier precompensation based proximity neurocorrection in Electron Beam Lithography.

【2h】

Optimal filtering versus regularization methods in the Fourier precompensation based proximity neurocorrection in Electron Beam Lithography.

机译：电子束光刻中基于傅立叶预补偿的近似神经校正的最优滤波与正则化方法。

页面导航

著录项
引文网络
相似文献
相关主题

著录项

作者
P. Jedrasik; J. Garcia; B. De Boeck; D Van Dyck;
展开▼
作者单位

展开▼
年度 2007
总页数
原文格式 PDF
正文语种
中图分类

相似文献

外文文献
中文文献
专利

1. Dose regularization via filtering and projection: An open-source code for optimization-based proximity-effect-correction for nanoscale lithography [J] . Eriksen Emil H., Nazir Adnan, Balling Peter, Microelectronic Engineering . 2018,第NOVa期

机译：通过过滤和投影进行剂量正则化：用于基于优化的纳米级光刻近距离效应校正的开源代码
2. An efficient method based on FIR filtering and fourier transform for solving the eigen-problems in optoelectronic devices [J] . Li Hongyu, Xi Yanping, Li Xun Optical and quantum electronics . 2018,第11期

机译：一种基于FIR滤波和傅立叶变换的有效方法来解决光电器件中的本征问题
3. Optimum precompensation filters for IQ modulation systems [J] . Tuthill J., Cantoni A. IEEE Transactions on Communications . 1999,第10期

机译：适用于IQ调制系统的最佳预补偿滤波器
4. Application of an electron-beam scattering parameter extraction method for proximity correction in direct-write electron-beam lithography [C] . Author(s): Rudolf M. Weiss Etec Systems Inc. Hayward CA USA, Robert M. Sills Etec Systems Inc. Hayward CA USA. Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing . 1991

机译：电子束散射参数提取方法在直写式电子束光刻中的邻近校正中的应用
5. Electron beam induced conductivity effect of polymer resists and charging induced electron beam deflection simulation in electron beam lithography. [D] . Hwu, Justin Jia-Jen. 2000

机译：聚合物抗蚀剂的电子束感应电导率效应和电子束光刻中的电荷感应电子束偏转模拟。
6. Comparison of treatment plan quality of VMAT for esophageal carcinoma with: flattening filter beam versus flattening filter free beam [O] . Wen-zhao Sun, Li Chen, Xin Yang, 2018

机译：扁平化滤光片与扁平化滤光片对食管癌VMAT治疗计划质量的比较
7. Optimal filtering versus regularization methods in the Fourierprecompensation based proximity neurocorrection in electron beam lithography [O] . Jedrasik P., García J., Boeck de B., 1998

机译：电子束光刻中基于傅里叶预补偿的邻近神经校正中的最佳滤波与正则化方法

Optimal filtering versus regularization methods in the Fourier precompensation based proximity neurocorrection in Electron Beam Lithography.

著录项

引文网络

相似文献

相关主题

期刊订阅