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Development of Chemical Solution Deposition Derived (001)-Oriented Epitaxial Bismuth Ferrite Thin-Films with Robust Ferroelectric Properties

机译:具有稳健的铁电性能的化学溶液沉积衍生的(001)取向外延铋铁氧体薄膜的研制

摘要

Bismuth ferrite (BiFeO3, BFO) has attracted recent attention due to its multi-functional properties, including multiferroism, resistive switching and photovoltaic effects. In particular, epitaxial BFO has been shown to demonstrate giant polarization, polarization-mediated resistive switching and unique magnetic properties. Until now, the most popular methods to obtain epitaxial BFO films with robust properties have been pulsed laser deposition (PLD) and radio frequency (RF) sputtering. Films made using these methods have been reported to have a high spontaneous polarization of up to 130 µC/cm2 and a switchable diode effect. Chemical deposition techniques, such as chemical solution deposition (CSD), have attracted recent interest for the preparation of BFO films and owing to them offering a cost-effective and more convenient manufacturing method compared with PLD and RF sputtering, an aspect of particular importance in an industrial context. However, the large scale adoption of CSD-derived BFO thin films for a variety of applications has been stymied by a number of significant limitations and challenges including: (1) the imprecision of the starting chemical composition and the subsequent volatilisation of Bi during the annealing step leading to the formation of secondary phases and/or highly conductive films with very poor leakage resistance; (2) variable sintering and densification behaviour leading to films having porosity and poor microstructures; and, (3) limited epitaxy between the film and substrate. Collectively, these dramatically impair the structural and electromechanical properties of the BFO films rendering them unsuitable for practical application. Thus, there is the important need to optimize the CSD preparation process for obtaining pure-phase epitaxial BFO.In this thesis, a non-aqueous CSD route was developed and studied with the aim to optimise it for the preparation of epitaxial (001) BFO thin films with robust (square) polarization hysteresis loops, high dielectric constant, strong piezoelectric response and distinct diode behavior. Molecular changes in the organic precursors on heating (determined by NMR and FTIR) and the effects of gelation temperature–time and thickness on film morphology were studied to develop an optimal deposition–gelation process for the synthesis of homogenous, defect-free gel films suitable for subsequent crystallization. The key to obtaining a homogenous gel was control of the delicate balance between gelation and salt (metal nitrate) precipitation through solvent evaporation. The optimized synthesis route consists of spin-coating 0.25 M precursor on 70°C preheated substrate at 3000 rpm for 30 seconds then gelating at 90°C then drying at 270°C.The crystallization of optimized gel films was studied as a function of Bi/Fe concentration and stoichiometry in the precursor solution, film thickness and single versus multiple depositions, crystallization temperature and atmosphere. Oxygen atmosphere was found to be essential for suppression of Bi volatilization and promotion of film epitaxial orientation. Pure-phase, epitaxial BFO thin film on (001)-strontium titanate (STO) substrate was obtained by rapidly heating the thin film to 650°C in an oxygen atmosphere and holding at the temperature for 30 minutes. A multi-layer deposition process for fabrication of films of various thicknesses was optimised by study of the deposition-heating sequence. The ferroelectric properties of pure-phase, epitaxial BFO thin films on lanthanum strontium manganite buffered (001)-STO substrates were studied as a function of thickness (40, 70, and 150 nm). The 70 and 150 nm films exhibited exhibited square hysteresis loops at room temperature with high remanent polarization (2Pr up to 100 μC/cm2), low coercive field (2Ec down to 193 kV/cm), and high relative dielectric constant (up to 613). High-cycle fatigue tests showed that these films are resistant to polarization fatigue (up to 108 cycles). All thicknesses showed resistive switching behaviour and a polarization-mediated diode effect both of which became more pronounced with decreasing thickness. The CSD technique developed in this work yielded high-quality BFO thin films and offers a viable low-cost alternative to current BFO deposition techniques.
机译:铁酸铋(BiFeO3,BFO)由于其多功能特性(包括多铁性,电阻切换和光伏效应)而引起了近期的关注。特别是,外延BFO已显示出巨大的极化,极化介导的电阻切换和独特的磁性。迄今为止,获得具有坚固性能的外延BFO膜的最流行方法是脉冲激光沉积(PLD)和射频(RF)溅射。据报道,使用这些方法制得的薄膜具有高达130 µC / cm2的高自发极化和可切换的二极管效应。化学沉积技术,例如化学溶液沉积(CSD),最近引起了人们对BFO膜制备的兴趣,这是因为与PLD和RF溅射相比,BFO膜提供了一种经济高效且更方便的制造方法,这一点在P工业环境。然而,CSD衍生的BFO薄膜在各种应用中的大规模采用受到许多重大限制和挑战的阻碍,这些挑战和挑战包括:(1)起始化学成分的不精确性以及随后在退火过程中Bi的挥发导致形成第二相和/或具有非常差的抗漏性的高导电膜的步骤; (2)可变的烧结和致密化行为导致膜具有孔隙率和不良的微结构; (3)在薄膜和基底之间的有限的外延。这些共同地极大地损害了BFO膜的结构和机电性能,使其不适合实际应用。因此,有必要优化CSD的制备工艺以获得纯相外延BFO。本文研究并研究了一种非水CSD路线,旨在对其进行优化以制备外延(001)BFO。具有鲁棒(方形)极化磁滞回线,高介电常数,强压电响应和独特二极管性能的薄膜。研究了有机前体在加热时的分子变化(由NMR和FTIR确定)以及胶凝温度,时间和厚度对膜形态的影响,从而开发了一种适合合成均质,无缺陷凝胶膜的最佳沉积-胶凝工艺。用于随后的结晶。获得均质凝胶的关键是通过溶剂蒸发控制凝胶化和盐(金属硝酸盐)沉淀之间的微妙平衡。优化的合成路线包括将0.25 M前体旋涂在70°C预热的基材上,以3000 rpm的速度旋转30秒,然后在90°C凝胶化,然后在270°C干燥。研究了优化的凝胶膜的结晶与Bi的关系前驱体溶液中的/ Fe浓度和化学计量比,膜厚,单次沉积与多次沉积,结晶温度和气氛。发现氧气气氛对于抑制Bi挥发和促进膜外延取向是必不可少的。通过在氧气气氛中将薄膜快速加热至650°C并在该温度下保持30分钟,从而获得(001)钛酸锶(STO)基板上的纯相外延BFO薄膜。通过研究沉积-加热顺序,优化了用于制造各种厚度薄膜的多层沉积工艺。研究了镧锶锰矿缓冲(001)-STO衬底上纯相外延BFO薄膜的铁电性能随厚度(40、70和150 nm)的变化。 70和150 nm薄膜在室温下表现出方形磁滞回线,具有高剩余极化(2Pr高达100μC/ cm2),低矫顽场(2Ec高达193 kV / cm)和高相对介电常数(高达613) )。高循环疲劳测试表明,这些薄膜可抵抗极化疲劳(高达108个循环)。所有厚度都显示出电阻切换行为和极化介导的二极管效应,这两者都随着厚度的减小而变得更加明显。在这项工作中开发的CSD技术产生了高质量的BFO薄膜,并为当前的BFO沉积技术提供了可行的低成本替代方案。

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