首页> 外国专利> Non c-axis oriented bismuth-layered perovskite ferroelectric structure epitaxially grown on buffered silicon

Non c-axis oriented bismuth-layered perovskite ferroelectric structure epitaxially grown on buffered silicon

机译:外延生长在缓冲硅上的非c轴取向铋层钙钛矿铁电结构

摘要

A structure containing a ferroelectric material comprises a substrate such as silicon, a buffer layer formed on the substrate, and a non-c-axis-oriented, electrically-conductive template layer formed on the buffer layer. The template layer comprises a perovskite oxide compound. An epitaxially a-axis-oriented ferroelectric layer is formed on the template layer, and has a vector of spontaneous polarization oriented perpendicular or at least substantially perpendicular to the film normal.
机译:包含铁电材料的结构包括:诸如硅的衬底,在该衬底上形成的缓冲层,以及在该缓冲层上形成的非c轴取向的导电模板层。模板层包含钙钛矿氧化物化合物。外延a轴取向的铁电层形成在模板层上,并具有垂直于或至少基本垂直于膜法线取向的自发极化矢量。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号