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High Pressure Effects in Semiconductors Interband Scattering in Germanium

机译:锗中半导体带间散射的高压效应

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摘要

Experimental and theoretical work shows that there are minima in the conduction bands of germanium and silicon along the (111) and the (100) directions in k-space. The (111) minima at an energy E are the lowest minima in the conduction band of germanium;while the (100) minima at an energy E are lowest in silicon.nResults of the measurement of the pressure variation of the electrical conductivity of n-type germanium at several temperatures between 0℃ and 82 0℃ to 18,000kg/cm2 and at 76℃ to 30,000 kg/cm2 are presented.nThe interband scattering scattering theory is extended to predict the pressure behavior of the galvanomagnetic effect in n-type germanium.

著录项

  • 作者

    Marshall I. Nathan;

  • 作者单位
  • 年度 1958
  • 页码 1-117
  • 总页数 117
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工业技术;
  • 关键词

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