Application of the Vacuum Technique to the Deposition of Thin Films by Ionic Sputtering

摘要

Characteristics and techniques of diode and triode sputtering are described as they apply to deposition of thin metallic films, and the advantages of sputtering over evaporation are enumerated. Details of equipment components are given and several available commercial devices are described. Brief consideration is given to the application of ionic sputtering to fabrication of microelectronic circuits. (ERA citation 03:035559)