Deposition under vacuum of boron-based thin film comprises ionic bombardment, e.g. on glass substrate to provide variety of functions for architectural glass for motor vehicle applications

摘要

The deposition under vacuum of a boron-based thin film on a substrate comprises : (A) selecting a pulverization species chemically active or inactive with regard to boron; (B) generating, from an ionic source, a collimated beam of ions of the species; (C) directing this beam towards a boron-based target; and (D) positioning the substrate opposite the target such that the pulverized material from ionic bombardment of the target is deposited on at least a part of the substrate surface. An independent claim is also included for a substrate, e.g. of glass, coated with a stack of thin films with an alternance of functional layers with reflective properties in the infrared and/or solar radiation and coatings of a dielectric material.