EXTREME-ULTRAVIOLET LITHOGRAPHY: Universities win USD17 million EUV grant

摘要

FORT COLLINS, CO - Three leading U.S. research universities have received a USD17 million National Science Foundation (NSF) grant to develop laser-driven light sources for extreme-ultraviolet (EUV) lithography. The technology is being developed through research conducted at the new NSF Engineering Research Center (ERC) for Extreme Ultraviolet (EUV) Science and Technology, headquartered at Colorado State and a joint collaboration among Colorado State University (Fort Collins, CO), the University of Colorado at Boulder, and the University of California at Berkeley. The goal of the center is to develop solutions to a variety of challenging scientific and industrial problems related to EUV lithography.