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Effect of Annealing Process on Properties of Pb(Zr_(0.52)Ti_(0.48))O_3 Thin Films Prepared by Sol-Gel Method

机译:退火工艺对溶胶-凝胶法制备Pb(Zr_(0.52)Ti_(0.48))O_3薄膜性能的影响

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摘要

The effect of the annealing process on properties of Pb(Zr_(0.48)Ti_(0.52))O_3 (PZT) thin films prepared by sol-gel method was systematically studied. PZT film deposited by the single layer pre-crystallization processing followed by multilayer crystallization processing is easy to grow along (110) orientation. The PZT films were prepared by the single layer annealing process and show (100) preferred orientation at lower crystallization temperature, while (111) and (110) orientation growth is occurs easily in higher the crystallization temperature. The PZT films deposited at higher crystallization temperature have larger average grain, but the high temperature cause the volatilization of lead, film density to decrease.
机译:系统研究了退火工艺对溶胶-凝胶法制备的Pb(Zr_(0.48)Ti_(0.52))O_3(PZT)薄膜性能的影响。通过单层预结晶处理然后进行多层结晶处理沉积的PZT膜易于沿(110)取向生长。 PZT膜是通过单层退火工艺制备的,在较低的结晶温度下显示(100)较好的取向,而在较高的结晶温度下则容易出现(111)和(110)取向。在较高的结晶温度下沉积的PZT膜具有较大的平均晶粒,但是高温导致铅的挥发,膜密度降低。

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