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Structural and electrical properties of excess PbO doped Pb(Zr 0.48Ti0.52)O3 thin films prepared by a MOD process

机译:通过MOD工艺制备的过量PbO掺杂Pb(Zr 0.48Ti0.52)O3薄膜的结构和电学性质

摘要

Pb(Zr0.52Ti 0.48)O3 thin films with 30 mol % excess Pb were deposited on Pt/Ti/SiO2/Si(100) substrates at 600 °C by a metal-organic decomposition process. The Pb/Zr ratio measured by Rutherford backscattering spectroscopy is higher than the stiochiometric ratio. X-ray diffraction measurements show that the PZT film has a perovskite structure but it also contains a PbO2 phase High resolution transmission electron microscope studies reveal that the nano sized PbO2 crystals are dispersed quite uniformly in the film. The film exhibits an abnormally slim polarization loop at low applied electric field probably as a result of domain pinning by the PbO2 crystals. The pinning effect can be overcome by applying a sufficiently high field. The film had good fatigue properties even with the presence of the PbO2 crystals.
机译:通过金属有机分解工艺,在600°C的条件下,将Pb / Zi / SiO2 / Si(100)衬底上沉积的Pb(Zr0.52Ti 0.48)O3薄膜中的Pb含量过量30 mol%。通过卢瑟福背散射光谱法测量的Pb / Zr比值高于化学计量比。 X射线衍射测量表明PZT膜具有钙钛矿结构,但它也包含PbO2相。高分辨率透射电子显微镜研究表明,纳米级PbO2晶体非常均匀地分散在膜中。薄膜可能在PbO2晶体的畴钉扎作用下,在较低的施加电场下表现出异常细长的极化环。通过施加足够高的电场可以克服钉扎效应。即使存在PbO2晶体,该膜也具有良好的疲劳性能。

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