Project for manufacturing a Russian EUV nanolithographer for the fabrication of chips according to technological standards of 22 nm

摘要

We examine the development of the project for manufacturing a Russian nanolithographer with an operating wavelength of λ = 13.5 nm for fabricating nanoelectronic element bases (chips) according to technological standards of 32-22 nm at the first stage and 22-16 nm at the second. A list of the project's main participants and their duties is presented. An overview of current situation in EUV lithography in Russia is given. The main problems to be solved on the road to mass production of electronic components involving EUV lithography are discussed.