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Growth of Uniform and Self-Aligned InAs Quantum Dots on Vicinal (100) GaAs Substrate by Metal Organic Chemical Vapor Deposition Technique for Laser Applications

机译:金属有机化学气相沉积技术在激光(100)GaAs衬底上生长均匀且自对准的InAs量子点

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Self-assembled InAs quantum dots (QDs) were grown on vicinal (100) GaAs substrate.Effect of InAs coverage and growth temperature was studied to optimize QDs for laserapplications. The density and size distribution of QDs varied with the change in InAscoverage and growth temperature. Growth temperature was varied from 400 to 450℃ and InAs coverage was varied between 1.40 and 2.35 monolayers (MLs). Optimumgrowth temperature was found to be 420℃. Density of QDs was first increased andthen decreased with increase in InAs coverage. Linear increase in size and height ofQDs was observed with increase in both growth temperature and InAs Coverage. It wasobserved that these two parameters play crucial role in optimization of uniform QDs.
机译:在邻近的(100)GaAs衬底上生长自组装的InAs量子点(QD)。研究了InAs覆盖率和生长温度的影响,以优化激光应用的QD。 QD的密度和大小分布随InAscoverage和生长温度的变化而变化。生长温度在400到450℃之间变化,InAs覆盖度在1.40和2.35单层(MLs)之间变化。发现最佳生长温度为420℃。随着InAs覆盖率的增加,量子点的密度首先增加,然后降低。随着生长温度和InAs覆盖率的增加,观察到QD的尺寸和高度线性增加。观察到这两个参数在优化统一QD中起着至关重要的作用。

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