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首页> 外文期刊>Current applied physics: the official journal of the Korean Physical Society >2D fluid simulation of capacitively coupled plasma with cylindrical electrode for roll-to-roll processing
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2D fluid simulation of capacitively coupled plasma with cylindrical electrode for roll-to-roll processing

机译:电容式耦合等离子体与圆柱形电极的二维流体模拟,用于卷对卷处理

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摘要

RF glow discharges are widely used in deposition, etching and surface treatments for semiconductor materials. Especially, roll-to-roll processing is necessary for flexible display or thin film solar cell modules. For a roll-to-roll thin film deposition processing, it is necessary to use cylindrical grounded electrode. The effects of electrode shapes on the plasma properties of capacitively coupled rf argon discharge at 13.56 MHz are investigated using self-consistent two-dimensional fluid simulation. The simulation model includes blocking capacitor and external circuit effects. Comprehensive analysis has been made in terms of time-varying currentevoltage characteristic, spatial distributions of plasma density and ion current density on the substrate. The effects of applied voltage (V-f = 200 similar to 800[V]) and gas pressure (p = 0.5 similar to 2 Torr) on the plasma properties are also investigated. We found that flat electrode has a little bit higher impedance than that of cylindrical ground electrode. However the difference between the two configurations is less than 5% therefore we may conclude that the shape of grounded electrode does not significantly affect currentevoltage characteristics of the discharge system. For roll-to-roll reactor version, displacement current come from dielectric layer between electrodes reaches more than 75% of total displacement current. Large displacement current results in degradation of power factor and matching circuit efficiency. For the cylindrical electrode, increasing electrode gap length along lateral direction makes that the location of peak electron density moves toward center of the reactor. The effect of the cylindrical electrode on the plasma spatial structure is reflected in the ion current density at substrate (dielectric layer) on grounded electrode. At low voltage and low power condition, about 90% of input power is consumed for electron heating. The efficiency decreases with increasing power and decreasing pressure as a consequence of increasing power to drive ion current. Electron heating efficiency decreased with pressure. The increase of pressure mainly reduces the diffusive component of the loss rate for both charged and neutral species. (C) 2015 Elsevier B.V. All rights reserved.
机译:RF辉光放电广泛用于半导体材料的沉积,蚀刻和表面处理。特别地,对于柔性显示器或薄膜太阳能电池模块而言,卷对卷处理是必需的。对于卷对卷薄膜沉积处理,必须使用圆柱形接地电极。使用自洽二维流体模拟研究了电极形状对13.56 MHz电容耦合rf氩放电等离子体性能的影响。仿真模型包括阻塞电容器和外部电路效应。已经对时变电流电压特性,等离子体密度和衬底上离子电流密度的空间分布进行了综合分析。还研究了施加电压(V-f = 200,类似于800 [V])和气压(p = 0.5,类似于2 Torr)对等离子体性能的影响。我们发现扁平电极的阻抗比圆柱形接地电极的阻抗高一点。但是,两种配置之间的差异小于5%,因此我们可以得出结论,接地电极的形状不会显着影响放电系统的电流电压特性。对于卷对卷电抗器版本,来自电极之间介电层的位移电流达到总位移电流的75%以上。大位移电流会导致功率因数下降和匹配电路效率下降。对于圆柱形电极,沿横向方向增加电极间隙长度会使峰值电子密度的位置移向反应器的中心。圆柱电极对等离子体空间结构的影响反映在接地电极上基板(介电层)的离子电流密度中。在低电压和低功率条件下,约90%的输入功率被消耗用于电子加热。由于功率增加以驱动离子电流,效率随着功率增加和压力降低而降低。电子加热效率随压力降低。压力的增加主要减少了带电和中性物质的损失率的扩散成分。 (C)2015 Elsevier B.V.保留所有权利。

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