CAPACITIVELY COUPLED PLASMA REACTOR HAVING MULTI-FREQUENCY DRIVE CAPACITIVELY COUPLED ELECTRODE ASSEMBLY AND PLASMA PROCESSING METHOD USING THE SAME AND DEVICE MANUFACTURED THEREBY

摘要

The present invention relates to a capacitively coupled plasma reactor having a multi-frequency driven capacitive coupling electrode assembly, a plasma processing method using the same, and a device manufactured thereby. The plasma reactor of the present invention includes a reactor body having a substrate support on which a substrate to be processed is placed, a capacitive coupling electrode assembly including a plurality of capacitive coupling electrodes for inducing a plasma discharge in the reactor body, At least two main power sources for supplying different frequencies, a switching circuit configured between the at least two main power sources and the capacitive coupling electrode assembly to provide a selective electrical connection, And a control unit for controlling the main power source to drive the capacitive coupling electrode at a selected frequency. Since the plasma reactor of the present invention can selectively drive the capacitive coupling electrode assembly at a selected one of two or more different frequencies, two or more different processes in one plasma reactor can be alternately performed successively, Can be maximized.;Capacitive coupled plasma, plasma reactor, current balance, laser, frequency, PECVD