Electr. Eng. & Comput. Sci. Dept. Univ. of Michigan Ann Arbor MI USA;
Monte Carlo methods; argon; organic compounds; oxygen; plasma diagnostics; plasma sources; plasma-wall interactions; Ar; Ar-O; HPEM; MCFPM; Monte Carlo feature profile module; anisotropic etching; chemically enhanced sputtering; critical dimension; dc self-bias; dual-frequency CCP; electrical asymmetric effects; energetic ion bombardment; frequency mixing; harmonic frequencies; hybrid plasma equipment model; integer multiple frequency drives; ion energy-angular distributions; ion fluxes; lEAD control; microelectronics fabrication; multifrequency capacitively coupled plasmas; nonsinusoidal waveforms; phase shifting; pressure 5 mtorr to 100 mtorr; radical fluxes; radiofrequency ion energy analyzer; rf frequency; rf phase locked harmonics; wafer substrate; Frequency control; Harmonic analysis; Plasmas; Radio frequency; Voltage control;
机译:在多频电容耦合等离子体中使用相移控制离子能量分布
机译:快速半解析法精确预测多频电容耦合等离子体中的离子能量分布函数和鞘层电场
机译:在Ar和Ar / CF _4 / O _2中维持的双频脉冲电容耦合等离子体的电子能量分布和等离子体特性的控制
机译:使用多频电容耦合等离子体中相移的离子能量分布控制
机译:使用能量和高能“快速”电子的密度测量亚稳态原子密度,电子能量分布函数中检测到与射频感应耦合等离子体氦放电产生的余辉等离子体相关的电子能量分布函数
机译:电容耦合等离子体电极上的电压分布用于产生大气压等离子体
机译:控制电子能量分布和等离子体特性的双频,脉冲电容耦合等离子体持续,AR和AR / CF4 / O2
机译:电感耦合等离子体反应器中离子能量分布函数的模型蚀刻剖面;应用物理学报