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机译:GLSI铜互连CMP新型弱碱性浆料的稳定性
School of Electronics and Information Engineering Hebei University of Technology Tianjin 300130 China;
School of Electronics and Information Engineering Hebei University of Technology Tianjin 300130 China;
School of Electronics and Information Engineering Hebei University of Technology Tianjin 300130 China;
School of Electronics and Information Engineering Hebei University of Technology Tianjin 300130 China;
School of Electronics and Information Engineering Hebei University of Technology Tianjin 300130 China;
School of Electronics and Information Engineering Hebei University of Technology Tianjin 300130 China;
School of Electronics and Information Engineering Hebei University of Technology Tianjin 300130 China;
stability; weakly alkaline slurry; CMP; copper interconnection;
机译:GLSI铜互连CMP新型弱碱性浆料的稳定性
机译:浆料对碱性浆料中铜CMP性能的影响
机译:具有新型弱碱性螯合剂的下一代阻隔CMP浆料
机译:制造平台上用于铜阻挡层CMP的弱碱性浆料的研究
机译:研究新型氧化铝纳米磨料及其在铜化学机械平面化(CMP)浆料中与基本化学成分的相互作用。
机译:在弱碱性溶液中24和26-N-烷基氨基双取代和2-N-烷基氨基取代的硝基苯的热不稳定性:仲氨基效应
机译:铜CMP浆料中保证分散稳定性的去除率优化