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Modeling and simulation of enhancement mode p-GaN Gate AlGaN/GaN HEMT for RF circuit switch applications

机译:增强模式的建模与仿真P-GaN门Algan / GaN HEMT用于RF电路开关应用

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摘要

An enhancement mode p-GaN gate AlGaN/GaN HEMT is proposed and a physics based virtual source charge model with Landauer approach for electron transport has been developed using Verilog-A and simulated using Cadence Spectre, in order to predict device characteristics such as threshold voltage, drain current and gate capacitance. The drain current model incorporates important physical effects such as velocity saturation, short channel effects like DIBL (drain induced barrier lowering), channel length modulation (CLM), and mobility degradation due to self-heating. The predicted I_d–V_(ds), I_d–V_(gs), and C–V characteristics show an excellent agreement with the experimental data for both drain current and capacitance which validate the model. The developed model was then utilized to design and simulate a single-pole single-throw (SPST) RF switch.
机译:提出了增强模式P-GaN门AlGaN / GaN HEMT,并且使用Verilog-A和使用Cadence Specter模拟了一种具有Landauer方法的物理虚拟源电荷模型,以预测诸如阈值电压的器件特性 ,漏极电流和栅极电容。 漏极电流模型包括重要的物理效果,例如速度饱和度,如DIBL(漏极感应的屏障降低),通道长度调制(CLM)等短信效应,以及由于自加热引起的迁移率劣化。 预测的I_D-V_(DS),I_D-V_(GS)和C-V特性显示出与验证模型的漏极电流和电容的实验数据的优异协议。 然后利用开发的模型来设计和模拟单极单掷(SPST)RF开关。

著录项

  • 来源
    《Journal of Semiconductors》 |2017年第6期|共6页
  • 作者

    D. K. Panda; T. R. Lenka;

  • 作者单位

    Microelectronics and VLSI Design Group Department of Electronics and Communication Engineering National Institute of Technology Silchar Assam 788010 India;

    Microelectronics and VLSI Design Group Department of Electronics and Communication Engineering National Institute of Technology Silchar Assam 788010 India;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;
  • 关键词

    CLM; DIBL; GaN; HEMT; SPST; Verilog-A;

    机译:CLM;DIBL;GAN;HEMT;SPST;VERILOG-A;

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