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An Improved Large Signal Model for 0.1 μm AlGaN/GaN High Electron Mobility Transistors (HEMTs) Process and Its Applications in Practical Monolithic Microwave Integrated Circuit (MMIC) Design in W band

机译:0.1μmAlGaN / GaN高电子迁移率晶体管(HEMT)工艺的改进大信号模型及其在W波段实用单片微波集成电路(MMIC)设计中的应用

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摘要

An improved empirical large signal model for 0.1 µm AlGaN/GaN high electron mobility transistor (HEMT) process is proposed in this paper. The short channel effect including the drain induced barrier lowering (DIBL) effect and channel length modulation has been considered for the accurate description of DC characteristics. In-house AlGaN/GaN HEMTs with a gate-length of 0.1 μm and different dimensions have been employed to validate the accuracy of the large signal model. Good agreement has been achieved between the simulated and measured S parameters, I-V characteristics and large signal performance at 28 GHz. Furthermore, a monolithic microwave integrated circuit (MMIC) power amplifier from 92 GHz to 96 GHz has been designed for validation of the proposed model. Results show that the improved large signal model can be used up to W band.
机译:本文提出了一种改进的针对0.1 µm AlGaN / GaN高电子迁移率晶体管(HEMT)工艺的经验大信号模型。为了准确描述DC特性,已经考虑了包括漏极引起的势垒降低(DIBL)效应和沟道长度调制在内的短沟道效应。内部栅极长度为0.1μm且尺寸不同的AlGaN / GaN HEMT已被用来验证大信号模型的准确性。在28 GHz下,仿真和测量的S参数,I-V特性和大信号性能之间已达成良好的协议。此外,已经设计了从92 GHz到96 GHz的单片微波集成电路(MMIC)功率放大器,用于验证所提出的模型。结果表明,改进的大信号模型可以在W波段使用。

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