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SiC chip attachment sintered by nanosilver paste and their shear strength evaluation

机译:由纳米玻璃浆料烧结的SIC芯片附件及其剪切强度评估

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In this study, a nanosilver paste was prepared by silver nanoparticles and organics, by which an SiC ship could be sintered on the direct bonding copper (DBC) substrate at 250-300 degrees C. The nanosilver paste firmly sintered the SiC chip and DBC substrate, and die attachment had an excellent bonding interface. Die-shear results showed that the shear strength increased with the increase of sintering temperature and was more than the value required by the MIL-STD-883J standard. When high assisted pressure was applied, the sintering temperature could be lowered and sintering time also could be shortened to realize attaching high bonding strength. The assisted pressure also influenced the porosity of the bondline. X-ray non-destructive method was used to measure the porosity of die attachment. The results showed that the shear strength of die attachment decreased with the increase of bondline porosity.
机译:在该研究中,通过银纳米颗粒和有机物制备纳米玻璃浆料,通过该有机物可以在250-300℃下在直接粘合铜(DBC)底物上烧结SiC船。纳米玻璃浆料牢固地烧结SiC芯片和DBC衬底 并且模具附件具有出色的粘合界面。 模切结果表明,剪切强度随着烧结温度的增加而增加,大于MIL-STD-883J标准所需的值。 当施加高辅助压力时,可以降低烧结温度并缩短烧结时间以实现高粘合强度。 辅助压力也影响了粘合线的孔隙率。 X射线非破坏性方法用于测量模具附着的孔隙率。 结果表明,随着粘合线孔隙率的增加,模具附着的剪切强度降低。

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