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Shear strength of die attachments prepared using dry nanosilver film by a time-reduced sintering process

机译:通过减少烧结工艺使用干纳米单体膜制备的模具附着的剪切强度

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This study investigates a time-reduced sintering process for die attachment, prepared, within a processing time of several seconds using dry nanosilver film. The effects of three main sintering parameters, sintering temperature (220 to 300 degrees C), sintering time (1 to 9 s) and bonding pressure (6 to 25 MPa) on the resultant shear strength are investigated using uniform design and single factor experimental trials. The shear strength data series for each of the experimental trials was statistically analyzed to indicate any deviation from normal distribution. The resulting shear strength values were regressed or fitted, and further analyzed by polynomial and kinetic-like equations to estimate the relationship between the shear strength and sintering parameters. The regression analysis for shear strength may not only be used for explaining mass transportation mechanisms, but also for identifying the proposed manufacturability of the time-reduced sintering process.
机译:该研究研究了使用干纳米膜膜在几秒钟的处理时间内制备的模具附着的减少烧结过程。使用均匀的设计和单一因素实验试验研究了三个主烧结参数,烧结温度(220至300℃),烧结时间(1至9℃),烧结时间(1至9秒)和粘合压力(6至25MPa)进行研究。统计分析每个实验试验的剪切强度数据系列以指示与正态分布的任何偏差。将得到的剪切强度值回归或装配,并通过多项式和动力学等方程进行进一步分析,以估计剪切强度和烧结参数之间的关系。剪切强度的回归分析可能不仅可以用于解释质量运输机制,而且还可以用于识别拟议的烧结过程的所提出的制造性。

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