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High-Power Nano- and Picosecond Optoelectronic Switches Based on High-Voltage Silicon Structures with p-n Junctions. III. Self-Heating Effects

机译:基于高压硅结构的高功率纳米和PICoSecond光电开关。 III。 自热效果

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The self-heating effects of optoelectronic switches based on vertical high-voltage structures with p-n junctions (Vertical Photoactivated Semiconductor Switches, VPSS) operating in the high-frequency mode are theoretically studied for the first time. It is shown that the strong temperature dependence of the control-radiation absorbance (T) is a major factor controlling the maximum switching frequency f(max) and the corresponding maximum crystal temperature T-max, as well as the temperature T and current density j distributions over the device area. Two-dimensional analysis of the simplest electrothermal model of a VPSS embedded into a double coaxial forming line shows that an increase in the switching frequency f leads to current displacement to the device periphery where the temperature is minimum. However, the T and j distributions over the device area remain stable at f < f(max) and T < T-max. Certainly, f(max) and T-max depend on the control-radiation pulse energy, pulse switching power, and heat-removal conditions. For the VPSS based on indirect-gap semiconductors (Si, SiC), they vary within 20-120 kHz and 120-160 degrees C which is quite sufficient for practical applications. However, VPSSs based on direct-gap semiconductors (GaAs, InP) are in fact inapplicable to operation in high-frequency modes due to the fact that the dependence (T) is too sharp.
机译:理论上首次研究了基于具有P-N结的垂直高压结构的光电开关的自热效应(垂直光活化的半导体开关,VPS)是第一次研究。结果表明,控制 - 辐射吸光度(t)的强烈温度依赖性是控制最大开关频率f(max)和相应的最大晶体温度t-max的主要因素,以及温度t和电流密度j在设备区域上的分布。嵌入到双同轴形成线中的VPS的最简单电热模型的二维分析表明,开关频率F的增加导致电流位移到温度最小的装置周边。但是,在设备区域上的t和j分布在f

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