首页> 外文期刊>Optics Letters >Performance enhancement of AlGaN-based 365 nm ultraviolet light-emitting diodes with a band-engineering last quantum barrier
【24h】

Performance enhancement of AlGaN-based 365 nm ultraviolet light-emitting diodes with a band-engineering last quantum barrier

机译:基于AlGan的365nm紫外发光二极管的性能提高了带工程最后的量子屏障

获取原文
获取原文并翻译 | 示例
           

摘要

In this Letter, the characteristics of the AlGaN-based nearultraviolet light-emitting diodes with a band-engineering last quantum barrier (LQB) were analyzed experimentally and numerically. The experimental results show that the peak wavelengths of UV-LEDs are around 368 nmwith a full width at half-maximum of 12 -14 nm, and the optical and electrical properties are improved by using an AlxGa1-xN LQB with a gradually decreasing Al content. The designed LQB can reduce the forward voltage from 4.35 to 4.29 V and markedly enhance LOP by 47.4% at an injection current of 200 mA, compared with the original structure. These improvements are mainly attributed to less electron leakage and higher hole injection efficiency, resulting from the weakened polarization field in the electron-blocking layer (EBL) and LQB, as well as the alleviation of the band bending at the EBL/LQB interface. (C) 2018 Optical Society of America
机译:在这封信中,通过实验且数值分析具有带工程最后量子屏障(LQB)的Algan基的接近硫螺旋式发光二极管的特性。 实验结果表明,UV-LED的峰值波长在半最大为12 -14nm的全宽度约为368 nm,并且通过使用Alxga1-XN LQB具有逐渐减小的Al含量来改善光学和电性能 。 与原始结构相比,设计的LQB可以将前向电压从4.35降至4.29 V,并在200mA的喷射电流下显着增强47.4%。 这些改进主要归因于电子泄漏较少的电子泄漏和更高的空穴注入效率,由电子阻挡层(EBL)和LQB中的弱化偏振场以及在EBL / LQB界面处的带弯曲的缓解。 (c)2018年光学学会

著录项

  • 来源
    《Optics Letters》 |2018年第3期|共4页
  • 作者单位

    South China Normal Univ Inst Optoelect Mat &

    Technol Guangdong Engn Res Ctr Optoelect Funct Mat &

    Devi Guangzhou 510631 Guangdong Peoples R China;

    Guangdong Acad Sci Guangdong Inst Semicond Ind Technol Guangzhou 510650 Guangdong Peoples R China;

    Guangdong Acad Sci Guangdong Inst Semicond Ind Technol Guangzhou 510650 Guangdong Peoples R China;

    Guangdong Acad Sci Guangdong Inst Semicond Ind Technol Guangzhou 510650 Guangdong Peoples R China;

    Guangdong Acad Sci Guangdong Inst Semicond Ind Technol Guangzhou 510650 Guangdong Peoples R China;

    Guangdong Acad Sci Guangdong Inst Semicond Ind Technol Guangzhou 510650 Guangdong Peoples R China;

    South China Normal Univ Inst Optoelect Mat &

    Technol Guangdong Engn Res Ctr Optoelect Funct Mat &

    Devi Guangzhou 510631 Guangdong Peoples R China;

    Guangdong Acad Sci Guangdong Inst Semicond Ind Technol Guangzhou 510650 Guangdong Peoples R China;

    South China Normal Univ Inst Optoelect Mat &

    Technol Guangdong Engn Res Ctr Optoelect Funct Mat &

    Devi Guangzhou 510631 Guangdong Peoples R China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 计量学;光学;
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号