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首页> 外文期刊>電子情報通信学会技術研究報告. 電子デバイス. Electron Devices >Memory operation of an AlGaAs/GaAs heterostructure FET with InAs quantum dots: near room temperature electric write and erase
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Memory operation of an AlGaAs/GaAs heterostructure FET with InAs quantum dots: near room temperature electric write and erase

机译:具有InAs量子点的AlGaAs / GaAs异质结FET的存储操作:接近室温的电写入和擦除

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摘要

An AlGaAs/GaAs heterostructure field effect transistor; with InAs quantum dots implanted in the barrier layer, has been developed. This device exhibits memory operation through a shift in the threshold voltage of the device. This shift can be explained by electron storage in the quantum dots. At 250K, the threshold voltage shift is approximately 0.1 V. This threshold shift is produced using a short writing time, less than 1 minute, at a positive bias and a long erase time of 10 minutes at a negative bias.
机译:AlGaAs / GaAs异质结构场效应晶体管;已经开发了在阻挡层中注入InAs量子点的方法。该器件通过改变器件的阈值电压来展现存储器操作。这种移动可以通过量子点中的电子存储来解释。在250K时,阈值电压偏移约为0.1V。此阈值偏移是在正偏压下使用不到1分钟的短写入时间,在负偏压下使用10分钟的较长擦除时间产生的。

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