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Temperature-dependent modulated reflectance and photoluminescence of InAs-GaAs and InAs-InGaAs-GaAs quantum dot heterostructures

机译:Inas-Gaas和Inas-InGaas-Gaas量子点异质结构的温度依赖性调制反射率和光致发光

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摘要

Optical transitions and electronic properties of epitaxial InAs quantum dots (QDs) grown with and without InGaAs strain-relieving capping layer within GaAs/AlAs quantum well (QW) are investigated. Modulated reflectance and photoluminescence spectroscopy is used to probe the QD- and QW-related interband optical transitions over the temperature range of 3–300 K. The observed spectral features in QDs are identified using numerical calculations in a framework of 8-band k⋅p k⋅p method. It is found that covering the dots by a 5 nm-thick InGaAs layer yields the energy red-shift of ground-state transition by ∼150 meV ∼150 meV . Moreover, the analysis of interband transition energy dependence on temperature using Varshni expression shows that material composition of InAs QDs significantly changes due to Ga/In interdiffusion. A comparison of emission- and absorption-type spectroscopy applied for InAs–GaAs QDs indicates a Stokes shift of ∼0.02 meV ∼0.02 meV above 150 K temperature.
机译:研究了在GaAs / AlAs量子阱(QW)中有和没有InGaAs应变消除覆盖层的情况下生长的外延InAs量子点(QD)的光学跃迁和电子性能。调制反射率和光致发光光谱用于探测3–300 K温度范围内与QD和QW相关的带间光跃迁。在8波段k⋅pk框架内使用数值计算来识别QD中观察到的光谱特征⋅p方法。已发现,用5 nm厚的InGaAs层覆盖点会产生基态跃迁的能量红移〜150 meV〜150 meV。此外,使用Varshni表达式分析带间跃迁能量对温度的依赖性表明,由于Ga / In互扩散,InAs量子点的材料组成发生了显着变化。应用于InAs-GaAs量子点的发射型和吸收型光谱的比较表明,在150 K温度以上,斯托克斯位移约为0.02 meV〜0.02 meV。

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