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Cathodoluminescence characteristics of pseudomorphic modulation-doped quantum well AlGaAs/InGaAs/AlGaAs heterostructures at high carrier densities and their radiation damaging

机译:高载流子密度下伪掺杂调制量子阱AlGaAs / InGaAs / AlGaAs异质结构的阴极发光特性及其辐射损伤

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摘要

Cathodoluminescence characteristics of modulation-doped transistor heterostructures AlGaAs/InGaAs/AlGaAs with the width of quantum well ~12 nm are investigated in this work. The investigation was conducted by means of cathodoluminescence generation depth changing, the depth depends on electron energy. So this fact permits to get cathodoluminescence characteristics from different depth of the investigated structure. The influence of gamma-radiation with several doses on the cathodoluminescence spectra was examined.
机译:这项工作研究了调制掺杂的晶体管异质结构AlGaAs / InGaAs / AlGaAs的阴极发光特性,其量子阱的宽度约为12 nm。研究是通过阴极发光产生深度的变化来进行的,该深度取决于电子能量。因此,该事实允许从所研究结构的不同深度获得阴极发光特性。研究了几种剂量的伽马射线辐射对阴极发光光谱的影响。

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