首页> 外文期刊>Journal of Superconductivity and Novel Magnetism >The Influence of KrF Excimer Laser Annealing on Magnetic and Structural Properties of FePt/PtIr Thin Films
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The Influence of KrF Excimer Laser Annealing on Magnetic and Structural Properties of FePt/PtIr Thin Films

机译:KrF受激准分子激光退火对FePt / PtIr薄膜的磁性和结构性能的影响

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A series of 60-nm FePt thin films were deposited by RF magnetron sputtering system on Si/SiO2 substrate. Platinum-iridium alloy was deposited as a buffer film between the FePt thin film and Si/SiO2 substrate. These films were annealed by KrF excimer laser annealing with 248 nm of wavelength. The number of laser pulses which were applied on the film was varied from 3 to 20. The A(1) to L-10 phase transformation of FePt was confirmed by X-ray diffraction. Three pulses of laser were not sufficient for A(1) to L-10 phase transformation. A maximum order parameter of 0.91 was obtained after applying 18 pulses of laser. The roughness of films changed in different pulses, and the films were in the best condition after applying 18 pulses; the roughness was 3.51 nm and its morphology that was observed from AFM was 129 nm. The maximum coercivity was 0.61 MA/m. The coercivity increased with the application of different pulses of laser. Increasing coercivity to the maximum value of 0.61 MA/m related to grain growth. Coercivity of samples in 3, 6, 9, 12, 18, and 20 pulses was 0.24, 0.402, 0.488, 0.522, 0.64, and 0.6 MA/m respectively. Determining the grain growth under condition of annealing was done by field emission scanning electron microscopy (FESEM). Growth of all specimens was calculated with imager software. Grain size in as deposited and 3, 6, 9, 12, and 18 pulses of laser was 15, 20, 29, 44, 47, and 59 respectively.
机译:通过射频磁控溅射系统在Si / SiO2衬底上沉积了一系列60 nm FePt薄膜。铂铱合金作为缓冲膜沉积在FePt薄膜和Si / SiO2衬底之间。这些薄膜通过波长为248 nm的KrF准分子激光退火进行退火。施加在薄膜上的激光脉冲数为3至20。通过X射线衍射确认了FePt的A(1)到L-10相变。三个激光脉冲不足以实现A(1)到L-10的相变。施加18个激光脉冲后,最大阶数参数为0.91。薄膜的粗糙度随着脉冲的变化而变化,施加18个脉冲后,薄膜处于最佳状态。粗糙度为3.51nm,从AFM观察到的形态为129nm。最大矫顽力为0.61 MA / m。矫顽力随着施加不同的激光脉冲而增加。将矫顽力提高到与晶粒生长有关的最大值0.61 MA / m。 3、6、9、12、18和20个脉冲中样品的矫顽力分别为0.24、0.402、0.488、0.522、0.64和0.6 MA / m。通过场发射扫描电子显微镜(FESEM)确定退火条件下的晶粒长大。使用成像仪软件计算所有样品的生长。所沉积的和3、6、9、12和18个激光脉冲的晶粒尺寸分别为15、20、29、44、47和59。

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