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首页> 外文期刊>Journal of Micromechanics and Microengineering >A 0.1-40 GHz broadband MEMS clamped-clamped beam capacitive power sensor based on GaAs technology
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A 0.1-40 GHz broadband MEMS clamped-clamped beam capacitive power sensor based on GaAs technology

机译:基于GaAs技术的0.1-40 GHz宽带MEMS夹钳式束电容式功率传感器

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摘要

This paper presents a 0.1-40 GHz broadband MEMS capacitive power sensor based on GaAs technology. An impedance compensation method utilizing a T-matching network is proposed to expand bandwidth. A lumped parameter model is established, the reflection coefficient, the voltage on the membrane and the sensitivity of RF-power detection are derived based on the multi-reflection transmission line theory. Performances of different up-states before pull-in are analysed when the membrane is electrostatic actuated. The proposed capacitive power sensor has been fabricated using GaAs process and MEMS technology. A controllable lateral etching technique is used to improve the sensitivity of RF-power detection and a low-spring-constant membrane is obtained. Measurement results show that return and insertion losses (S_(11) and S_(21)) are less than -20.31 and 0.29 dB up to 40 GHz, respectively. DC voltage measurement indicates a low pull-in voltage of 10 V. Sensitivities of different operating frequencies are measured to be 11.6 aF mW~(-1) at 5 GHz, 11.3 aF mW~(-1) at 15 GHz, 10.8 aF mW~(-1) at 25 GHz and 10.4 aF mW~(-1) at 35 GHz. Frequency dependence measurements show a decreasing trend of sensitivity with the increase of frequency.
机译:本文提出了一种基于GaAs技术的0.1-40 GHz宽带MEMS电容式功率传感器。提出了一种利用T匹配网络的阻抗补偿方法来扩展带宽。建立了集总参数模型,基于多反射传输线理论推导了反射系数,膜片上的电压和射频功率检测的灵敏度。当膜被静电驱动时,将分析吸合前不同状态的性能。拟议的电容式功率传感器已使用GaAs工艺和MEMS技术制造。使用可控的横向蚀刻技术来提高RF功率检测的灵敏度,并获得低弹簧常数膜。测量结果表明,在40 GHz时,回波损耗和插入损耗(S_(11)和S_(21))分别小于-20.31和0.29 dB。直流电压测量表明有10 V的低吸合电压。不同工作频率的灵敏度在5 GHz时为11.6 aF mW〜(-1),在15 GHz时为11.3 aF mW〜(-1),10.8 aF mW在25 GHz时约为〜(-1),在35 GHz时约为10.4 aF mW〜(-1)。频率相关性测量结果显示,灵敏度随频率增加而降低。

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