Investigation of the electrical contact behaviors in Au-to-Au thin-film contacts for RF MEMS switches

摘要

This paper presents the electrical contact behaviors of gold-to-gold thin-film contacts under high current conditions and describes the major factors that influence these contact behaviors for radio frequency microelectromechanical system switches. The fundamental phenomena in the contact resistance versus contact force curve were investigated with a contact measurement setup, which we devised. Based on the experimental results, the contact resistance behavior with increasing contact force can be divided into three regions: first, an unstable contact regime before the minimum contact force is reached; second, a stable contact regime where the plastic deformation of the asperities explains the behavior and, finally, a saturated regime where the thickness effect of the film on a hard substrate becomes evident. The minimum contact force required for a stable contact depended on the roughness of the surface and the current flow through the contact. The smooth surface of the Au film and the metal softening caused by a high current flow of 100 mA had the effect of lowering the minimum contact force. After the minimum contact force is exceeded, the contact resistance initially follows the asperity plastic deformation behavior, where the contact resistance is related to the resistivity and hardness of the contact material. In the higher contact force regime, the decrease in the contact resistance becomes almost negligible. With increasing contact force, the effective contact area is limited by the effect of the film thickness on a hard substrate. From these results, we found the principal factors influencing the contact behaviors of the Au-to-Au contacts to be the resistivity, hardness and softening temperature of the contact materials and the design factors such as the surface roughness, the film thickness and the substrate.