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Mechanical properties of DLC films prepared by bipolar pulsed DC PACVD

机译:双极脉冲直流PACVD制备DLC膜的机械性能

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The most common method for the deposition of DLC films is radio frequency PACVD (rf, 13.56MHz), which is technically difficult and expensive to scale up to industrial dimensions. Alternativemethods are direct current (DC) or medium frequency (mf) plasma excitation which are easier andcheaper to scale up. The deposition of DLC coatings by bipolar-pulsed direct current PACVD (bp DCPACVD) will be discussed. The experiments were carried out in a commercially available plasmanitriding plant. Adhesion was improved by an intermediate Si-C:H layer using tetramethylsilane(Si(CH{sub}3){sub}4) as a precursor. Methane (CH{sub}4) was used for depositing the DLC films.The mechanical properties of the films such as hardness, Young's modulus, and wear resistance werestudied as a function of the process parameters such as bias current, pressure and methane flow andcould be correlated to the reduced parameter J/P{sup}(0.5) The properties thus obtained arecomparable with those by rf PACVD.
机译:沉积DLC膜的最常见方法是射频PACVD(rf,13.56MHz),从技术上讲,按比例放大到工业尺寸非常困难且昂贵。替代方法是直流(DC)或中频(mf)等离子体激发,这种激发更容易且更便宜。将讨论通过双极脉冲直流PACVD(bp DCPACVD)沉积DLC涂层的方法。实验在可商购的等离子氮化工厂中进行。通过使用四甲基硅烷(Si(CH {sub} 3){sub} 4)作为前体的中间Si-C:H层提高了附着力。使用甲烷(CH {sub} 4)沉积DLC薄膜。研究了薄膜的机械性能(例如硬度,杨氏模量和耐磨性)与工艺参数(例如偏置电流,压力和甲烷流量和压力)的函数关系。与减小的参数J / P {sup}(0.5)相关。由此获得的性质可与通过rf PACVD获得的性质相比。

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