Microstructural, nanomechanical and tribological properties of ZrAlN thin films prepared by pulsed DC magnetron sputtering

机译：脉冲直流磁控溅射制备ZrAlN薄膜的微观结构，纳米力学和摩擦学性能

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An investigation on the structural, nano-mechanical and tribological properties of thin films of ZrAlN deposited on (100) Si and D-9 alloy substrates prepared by pulsed DC magnetron is reported. Zr1-xAlxNy films have been studied with the Al concentration range of 0

机译：研究了在脉冲直流磁控管制备的（100）Si和D-9合金基底上沉积的ZrAlN薄膜的结构，纳米机械和摩擦学性能。研究了Zr1-xAlxNy薄膜，其Al浓度范围为0

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来源
《2013 International Conference on Advanced Nanomaterials and Emerging Engineering Technologies》|2013年|55-57|共3页
会议地点 Chennai(IN)
作者
Kuppusami P.; Singh Akash; Mohandas E.;
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作者单位

Centre or Nanoscience and Nanotechnology, Sathyabama University, Chennai-600 119, Indiac;

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会议组织
原文格式 PDF
正文语种 eng
中图分类
关键词
Coefficient of Friction; Hardness; Magnetron Sputtering; Microstructure;

机译：摩擦系数硬度磁控溅射显微组织;

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专利

1. Influence of nitrogen flow rate on microstructural and nanomechanical properties of Zr-N thin films prepared by pulsed DC magnetron sputtering [J] . Akash Singh, P. Kuppusami, Shabana Khan, Applied Surface Science . 2013,第sepa1期

机译：氮气流量对脉冲直流磁控溅射制备Zr-N薄膜的微观结构和纳米力学性能的影响
2. Influence of substrate bias on microstructural evolution and mechanical properties of TiAlSiN thin films deposited by pulsed-DC magnetron sputtering [J] . Cao Fuyang, Munroe Paul, Zhou Zhifeng, Thin Solid Films . 2017,第octa1期

机译：衬底偏压对脉冲直流磁控溅射沉积TiAlSiN薄膜微结构演变和力学性能的影响
3. Effect of deposition temperature on the properties of Al-doped ZnO films prepared by pulsed DC magnetron sputtering for transparent electrodes in thin-film solar cells [J] . Doo-Soo Kim, Ji-Hyeon Park, Beom-Ki Shin, Applied Surface Science . 2012,第期

机译：沉积温度对脉冲直流磁控溅射制备的薄膜太阳能电池透明电极Al掺杂ZnO薄膜性能的影响
4. Microstructural, nanomechanical and tribological properties of ZrAlN thin films prepared by pulsed DC magnetron sputtering [C] . Kuppusami P., Singh Akash, Mohandas E. International Conference on Advanced Nanomaterials and Emerging Engineering Technologies . 2013

机译：脉冲DC磁控溅射制备的ZrANN薄膜的微观结构，纳米力学和摩擦学性质
5. The deposition and characterization of high dielectric constant films prepared by pulsed reactive DC magnetron sputtering technique. [D] . Kim, Jin-Young. 2000

机译：脉冲反应直流磁控溅射技术制备的高介电常数薄膜的沉积和表征。
6. Structural and nanomechanical properties of BiFeO3 thin films deposited by radio frequency magnetron sputtering [O] . Sheng-Rui Jian, Huang-Wei Chang, Yu-Chin Tseng, 2013

机译：射频磁控溅射沉积BiFeO3薄膜的结构和纳米力学性能
7. CrNx Films Prepared by DC Magnetron Sputtering and High-Power Pulsed Magnetron Sputtering: A Comparative Study [O] . Greczynski, Grzegorz, Jensen, Jens, Hultman, Lars 2010

机译：直流磁控溅射与大功率脉冲磁控溅射制备CrNx薄膜的比较研究

Microstructural, nanomechanical and tribological properties of ZrAlN thin films prepared by pulsed DC magnetron sputtering

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