Positive direct-mask stereolithography with multiple-layer exposure: layered fabrication with stair step reduction

摘要

In this paper, we explain a new stereolithography involving the separate use of liquid photoinitiator and a base resin (photopolymer resin without photoinitiator). First, the base resin is supplied as a layer, and then a mask pattern is drawn onto the surface with photoinitiator by inkjet printing. When the surface is exposed to a UV lamp, only the pattern drawn with the photoinitiator is cured. In this process, the photoinitiator acts as a positive mask. Also, the idea of multiple-layer exposure, which may enable stair step reduction and fabrication time reduction, is introduced. The proposed idea and method are implemented in an experimental stereolithography system and some experiments are conducted using the system. As a result, the effectiveness and feasibility of the idea and method are confirmed.