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Fabrication of CIGS absorber layers using a two-step process for thin film solar cell applications.

机译:CIGS吸收层的制造采用了两步工艺,用于薄膜太阳能电池应用。

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摘要

Copper Indium Gallium DiSelenide absorber layers are fabricated using a two step manufacturing-friendly process. The first step involves the sequential deposition of Copper and Gallium and codeposition of Indium and Selenium, not necessarily in that order, at 275°C. This is followed by the second stage, where the substrate is annealed in the presence of Selenium and a thin layer of Copper is deposited to neutralize the excess Indium and Gallium on the surface to form the Copper Indium Gallium diSelenide absorber layer. Elimination of the need for high degree of control and elimination of toxic gases like hydrogen selenide aid in the easy scalability of this process to industry.; The performance of CuInGaSe2/CdS/ZnO solar cells thus fabricated was characterized using techniques such as I-V, C-V, Spectral Response and EDS/SEM. Cells with open circuit voltages of 450--475 mV, short circuit current densities of 30--40 mA/cm2, fill factors of 60--68% and efficiencies of 8--12% were routinely fabricated. Gallium in small amounts seems to improve the open circuit voltages by 50--100 mV without significantly affecting the short circuit currents and the band gap in Type I precursors. Gallium also improves the adhesion of the CIS layer to the molybdenum back contact.; Efforts are also being aimed at improving the short circuit current densities in our high bandgap devices. It is believed that improperly bonded Ga is hurting the electronic properties of the CIGS films. A part of this work involves the reduction of the detrimental effect of Ga on the Jsc's by modifying the base process, so as to improve the homogeneity of the film. The modifications include lowering the Ga level as well as fine-tuning the annealing step. Ar annealing of the samples has also been incorporated. The short circuit current densities have been improved significantly by the above mentioned modifications. At present, the best Jsc's are in the 33--35 mA/cm2 range. The Voc's have also been improved by splitting the Ga into two layers and replacing the top Cu layer by a Ga layer. Light soaking studies of the absorber have also been carried out.; The baseline Type I process has also been adapted to a new load-locked in-line evaporator system. Device performance dependence on Ga and In thickness as well as the top selenization temperature has been determined in this research. The effect of moisture on the quality of the films has been studied. Bandgap variations due to the presence/absence of Se during the Cu deposition has been investigated. The impact of substrate cleaning/Moly deposition conditions on the device performance has been explored. In situ Ar annealing studies of CIGS absorbers have been carried out. Alternate buffer layers have been pursued. Devices with Voc's as high as 480 mV, Jsc's as high as 40.7 mA/cm2 and fill factors of 66% have been fabricated.
机译:铜铟镓二硒化物吸收层采用两步制造友好型工艺制造。第一步包括在275°C下依次沉积铜和镓以及共沉积铟和硒(不一定按此顺序)。接下来是第二阶段,在该阶段中,在硒的存在下对基板进行退火,并沉积一层铜薄层,以中和表面上过量的铟和镓,从而形成铜铟镓二硒化物吸收层。消除了对高度控制的需求并消除了诸如硒化氢之类的有毒气体,从而使该工艺易于扩展至工业生产。使用I-V,C-V,光谱响应和EDS / SEM等技术表征了如此制造的CuInGaSe2 / CdS / ZnO太阳能电池的性能。常规制造的电池的开路电压为450--475 mV,短路电流密度为30--40 mA / cm2,填充系数为60--68%,效率为8--12%。少量的镓似乎可以将开路电压提高50--100 mV,而不会显着影响I型前驱物的短路电流和带隙。镓还改善了CIS层与钼背面接触的附着力。我们还致力于提高高带隙器件的短路电流密度。可以认为,Ga键合不当会损害CIGS膜的电子特性。这项工作的一部分涉及通过修改基础工艺来减少Ga对Jsc的有害作用,从而提高薄膜的均匀性。修改包括降低Ga含量以及微调退火步骤。还加入了样品的Ar退火。通过上述修改,短路电流密度得到了显着改善。目前,最好的Jsc在33--35 mA / cm2范围内。通过将Ga分为两层并用Ga层代替顶部的Cu层,还改善了Voc。还已经进行了吸收器的轻浸研究。基线I型过程也已适应新的负载锁定在线蒸发器系统。这项研究确定了器件性能对Ga和In厚度以及最高硒化温度的依赖性。研究了水分对薄膜质量的影响。已经研究了由于Cu沉积过程中硒的存在/不存在引起的带隙变化。已经探索了衬底清洁/钼沉积条件对器件性能的影响。已经进行了CIGS吸收剂的原位Ar退火研究。已经寻求替代的缓冲层。已制造出Voc高达480 mV,Jsc高达40.7 mA / cm2,填充系数为66%的器件。

著录项

  • 作者

    Sankaranarayanan, Harish.;

  • 作者单位

    University of South Florida.;

  • 授予单位 University of South Florida.;
  • 学科 Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 2004
  • 页码 155 p.
  • 总页数 155
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;
  • 关键词

  • 入库时间 2022-08-17 11:44:20

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