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A feasibility study on the micro electro-discharge machining process for photomask fabrication

机译:光掩模制造中的微放电加工工艺的可行性研究

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摘要

A feasibility study of micro electro-discharge machining (microEDM) technology has been conducted for its possible contribution in the photomask industry. A series of experimental runs was performed on three specimens using a micro-EDM system with built-in wire electro-discharge grinding. Different thicknesses of chromium films were coated on borosilicate glass substrate. Unwanted chromium metal was machined through to the transparent glass substrate, leaving behind the desired pattern. In this study; lines were machined at different voltages, using electrodes of 20 μm in diameter, and no significant wear of electrodes was observed. The machined regions on the specimens were quantified in terms of linewidth deviation and light transmission. The experimental results showed that the linewidth deviations for all three specimens are below the 10% cut-off threshold. The best average light transmission obtained from this experiment was 75.8% at 90 V. The results gathered so far, suggests that the application of micro-EDM to produce a photomask is an acceptable process.
机译:微放电加工(microEDM)技术的可行性研究已经进行,因为它可能对光掩模行业做出贡献。使用带有内置电火花线切割磨削的micro-EDM系统,对三个样品进行了一系列实验。在硼硅酸盐玻璃基板上涂覆不同厚度的铬膜。将不需要的铬金属加工到透明玻璃基板,留下所需的图案。在这个研究中;使用直径为20μm的电极在不同的电压下加工线,并且未观察到明显的电极磨损。根据线宽偏差和透光率对样品上的加工区域进行定量。实验结果表明,所有三个样品的线宽偏差均低于10%的截止阈值。从该实验获得的最佳平均光透射率是在90 V时为75.8%。到目前为止收集的结果表明,使用微型EDM生产光掩模是可以接受的过程。

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