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Time-dependent transport properties in quantum well with thin inserted layer

机译:具有薄插入层的量子阱中随时间变化的传输特性

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We investigate the time-dependent transport properties of quantum well on the situation of nonlinear bias, where a thin potential well layer is inserted in the main quantum well. In our calculations, we consider the effects from all kinds of phonon interactions in the device. We find that the charge redistribution and electron motion in the whole structure play an important effect on the final current-voltage (I-V) curve. We also find an evident current hysteresis region and current high-frequency oscillation with time in this particular region. The results show that the inserted potential well layer can make the current hysteresis width narrower than that in the single quantum well structure, and it also damps the current oscillation. Due to the existence of the inserted layer, the plateau structure of I-V curve found in the single quantum well disappears.
机译:我们研究了非线性偏置情况下量子阱随时间的传输特性,其中在主量子阱中插入了一层薄的势阱层。在我们的计算中,我们考虑了设备中各种声子相互作用的影响。我们发现,整个结构中的电荷重新分布和电子运动对最终电流-电压(I-V)曲线起重要作用。我们还发现在该特定区域中存在明显的电流滞后区域和电流高频振荡随时间的变化。结果表明,所插入的势阱层可以使电流滞后宽度比单量子阱结构中的更窄,并且还可以抑制电流振荡。由于插入层的存在,在单量子阱中发现的I-V曲线的平台结构消失了。

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