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首页> 外文期刊>Microelectronics journal >Transport Properties And Observation Of Quantum Hall Effects Of Inas_(0.1)sb_(0.9) Thin Layers Sandwiched Between Al_(0.1)in_(0.9)sb Layers
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Transport Properties And Observation Of Quantum Hall Effects Of Inas_(0.1)sb_(0.9) Thin Layers Sandwiched Between Al_(0.1)in_(0.9)sb Layers

机译:夹在Al_(0.1)in_(0.9)sb层之间的Inas_(0.1)sb_(0.9)薄层的传输性质和量子霍耳效应的观察

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摘要

InAs_(0.1)Sb_(0.9) active layers sandwiched between Al_(0.1)In_(0.9)Sb insulating buffer layers were grown on GaAs (100) substrates by molecular beam epitaxy. The basic transport properties at room temperature and quantum Hall effects at low temperature of the InAs_(0.1)Sb_(0.9) were studied as a function of InAs_(0.1)Sb_(0.9) thickness. The electron mobility of the InAs_(0.1)Sb_(0.9) active layers had a very high value and very small thickness dependence at less than 500 nm. The quantum Hall effects of the InAs_(0.1)Sb_(0.9) were observed at thicknesses 15, 20, 30, 50, 70, and 100 nm. The observation of the quantum Hall effect at thickness more than 50 nm strongly suggests the existence of two-dimensional electron gas in the InAs_(0.1)Sb_(0.9) layer sandwiched between Al_(0.1)In_(0.9)Sb layers.
机译:通过分子束外延在GaAs(100)衬底上生长夹在Al_(0.1)In_(0.9)Sb绝缘缓冲层之间的InAs_(0.1)Sb_(0.9)有源层。研究了InAs_(0.1)Sb_(0.9)的室温下的基本输运性质和低温下的量子霍耳效应,作为InAs_(0.1)Sb_(0.9)厚度的函数。 InAs_(0.1)Sb_(0.9)有源层的电子迁移率在小于500 nm时具有很高的值和很小的厚度依赖性。在厚度15、20、30、50、70和100 nm处观察到InAs_(0.1)Sb_(0.9)的量子霍尔效应。厚度大于50 nm的量子霍尔效应的观察强烈表明,夹在Al_(0.1)In_(0.9)Sb层之间的InAs_(0.1)Sb_(0.9)层中存在二维电子气。

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