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Defect Formation in Epitaxial Layers of Cadmium Mercury Telluride Solid Solutions Highly Doped with Indium

机译:高掺杂铟碲化镉汞固溶体外延层中的缺陷形成

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摘要

We have studied the effect of strong (up to 5 × 10{sup}21 cm{sup}(-3)) indium doping on the behavior of components in cadmium mercury telluride solid solutions. At an indium concentration in a modified subsurface layer on the order of 10{sup}21 cm{sup}(-3), these layers are depleted of mercury and cadmium; simultaneously, cadmium is segregated in the region immediately below the indium-doped surface layer. The strong doping with indium leads to the formation of extended defects, which is manifested by characteristic patterns in electron micrographs observed after chemical etching. The observed redistribution of the solid solution components upon doping is explained by peculiarities of the defect formation in cadmium mercury tellurides.
机译:我们研究了强(最多5×10 {sup} 21 cm {sup}(-3))铟掺杂对碲化镉汞固溶体中组分行为的影响。在改性的地下层中的铟浓度大约为10 {sup} 21 cm {sup}(-3)时,这些层中的汞和镉将被消耗掉。同时,镉被隔离在掺杂铟的表面层正下方的区域中。铟的强掺杂导致形成扩展的缺陷,这通过化学蚀刻后观察到的电子显微照片中的特征图案得以体现。碲化镉汞中缺陷形成的特殊性解释了在掺杂时观察到的固溶体组分的重新分布。

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