An IR-Spectroscopy Study of the Radiation-Chemical Transformation of w-Hexane on the Silicon Surface

摘要

The radiation-chemical decomposition of n-hexane in the Si-n-hexane system under the action of y radiation at room temperature has been studied by reflection-absorption IR spectroscopy. It has been shown that the adsorption of n-hexane on the silicon surface occurs by the molecular and dissociative mechanisms. It has been found that the radiolysis of n-hexane at absorbed dose D_y of 5-50 kGy is accompanied by the formation of surface intermediate active decomposition products: silicon alkyls, % complexes of olefins, and silicon hydrides. The kinetics of accumulation of the final decomposition product-molecular hydrogen-has been analyzed to determine its radiation-chemical yield of G_(ads)(H_2) = 36.4 molecules/100 eV. A possible mechanism of this process has been discussed.