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Microphotoluminescence characterization of alloy fluctuations in InGaAsN/GaAs quantum wells emitting at 1.3 μm

机译:InGaAsN / GaAs量子阱中以1.3μm发射的合金涨落的微光致发光特性

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摘要

Microphotoluminescence studies of annealed In(x)Ga(1 — x)N(y)As(1 — y)/ GaAs quantum wells fabricated by molecular beam epitaxy for optical emission in the 1.3 μm spectral range revealed several sharp peaks about 2-7 meV wide in the emission spectra. The intensity of the discrete lines decreased strongly with increasing lattice temperature and was absent in as-grown (unannealed) quantum wells. Such quantum dot-like emission lines are attributed to the recombination of excitons strongly localized at alloy fluctuations composed of In-N-rich clusters.
机译:通过分子束外延法制备的In(x)Ga(1_x)N(y)As(1 y)/ GaAs量子阱在1.3μm光谱范围内的光发射退火态的微光致发光研究显示出几个尖锐的峰,大约2-7发射光谱中的meV宽。离散线的强度随着晶格温度的升高而大大降低,并且在未生长(未退火)的量子阱中不存在。这样的量子点状发射线归因于激子的重组,该激子强烈地位于由富含In-N的团簇组成的合金起伏处。

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