AC Bipolar Pulsed Power Supply for Reactive Magnetron Sputtering

摘要

This paper presents an ac bipolar pulsed power supply, which is used to drive a magnetron sputtering reactor operating under reactive atmosphere. The power supply was tested for the deposition of thin films of ZnO:Al on glass and plastic substrates. Voltage, current, and optical spectroscopy measurements were performed during the discharge. The electrical aspects of the ac bipolar pulsed magnetron discharge operating with reactive gases at pressures below 0.066 kPa are discussed. To characterize the power transferred to the plasma, electrical parameters are measured with calibrated current and voltage probes. The rate of deposition and their characteristics are also discussed.