Pretreating and/or coating bodies with high power impulse magnetron sputtering-power supplies in metallic coating chamber, comprises synchronizing pulses of power supplies to each other, and producing gas- and metal ions by power supplies

摘要

The method comprises synchronizing the pulses of the high power impulse magnetron sputtering (HIPIMS)-power supplies to each other, producing gas- and metal ions by the HIPIMS-power supply during the energy is supplied by the HIPIMS-power supply to accelerate the gas- and metal ions on a body, cleaning and etching the body for the pretreatment, and producing a transition coating in which the metal ions from the magnetron source are implanted into the body and subsequently applying an adhesive coating which contains the metal ions from the magnetron source, on the body. The method comprises synchronizing the pulses of the high power impulse magnetron sputtering (HIPIMS)-power supplies to each other, producing gas- and metal ions by the HIPIMS-power supply during the energy is supplied by the HIPIMS-power supply to accelerate the gas- and metal ions on a body, cleaning and etching the body for the pretreatment, and producing a transition coating in which the metal ions from the magnetron source are implanted into the body and subsequently applying an adhesive coating which contains the metal ions from the magnetron source, on the body. One of the HIPIMS-power supplies is connected to a magnetron-sputtering source and other HIPIMS-power supply is connected as supply to the body to be pretreated and/or coated. The HIPIMS-power supply acts as bias-supply for the body. A high coating adhesion is produced between the bodies and the coating. A gas is inserted and then plasma is ignited above the magnetron-sputtering source. The plasma and substrate bias are maintained by the HIPIMS-power supply. The transition coating is produced, so that the peak voltage and the power of the HIPIMS-power supply are continuously reduced. The body is provided with a further coating, which is a diamond-like carbon coating and/or a carbon-based coating. The pulses are synchronized, so that a temporal overlap with pulses of the HIPIMS-power supply occurs with all the pulses of the HIPIMS-power supply and the pulse voltage at the HIPIMS-power supply lies close to the pulse generated by the HIPIMS-power supply during entire pulse time. An independent claim is included for a device for pretreating and/or coating bodies with two high power impulse magnetron sputtering (HIPIMS)-power supplies in a metallic coating chamber using magnetron-sputtering.