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首页> 外文期刊>IEEE microwave and wireless components letters >An Exploration of Substrate Coupling at K-Band Between a SiGe HBT Power Amplifier and a SiGe HBT Voltage-Controlled-Oscillator
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An Exploration of Substrate Coupling at K-Band Between a SiGe HBT Power Amplifier and a SiGe HBT Voltage-Controlled-Oscillator

机译:SiGe HBT功率放大器和SiGe HBT压控振荡器之间的K波段衬底耦合研究

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摘要

This work presents a case study of circuit-to-circuit substrate coupling between a 24-GHz power amplifier (PA) and a 23-GHz voltage-controlled oscillator (VCO) implemented in a commercially-available SiGe heterojunction bipolar transistor BiCMOS technology. The concurrent operation of these two circuits on the same silicon die results in -33dB of coupling between the PA''s output and the VCO''s output. Different testing configurations are considered to verify the dominant path of the coupling. These results highlight the potential challenges for silicon-based monolithic systems targeting microwave operational frequencies
机译:这项工作提出了一个以商业上可买到的SiGe异质结双极晶体管BiCMOS技术实现的24 GHz功率放大器(PA)和23 GHz压控振荡器(VCO)之间的电路间基板耦合的案例研究。这两个电路在同一硅芯片上的并行操作导致PA输出和VCO输出之间的耦合-33dB。考虑使用不同的测试配置来验证耦合的主要路径。这些结果凸显了针对微波工作频率的硅单片系统的潜在挑战

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