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Multiple surface driving method for the accurate sculpting of predefined arbitrary surfaces in the micro/nano regime

机译:多表面驱动方法,用于在微米/纳米范围内精确雕刻预定义的任意表面

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摘要

In this paper, a method is introduced for the realizing precise surface sculpting in the sub-micrometer scale. The method is based on well known surface propagation theory that surface moves its surface normal direction according to Huygens theory. Surface driving forces such as incident ion beam flux and redeposition flux can be controlled such a way that the surface driving speed is controlled at the position of the each pre-sliced layer. In this way any surfaces can be fabricated in the presence of proper conditions; pixel overlap, dwell times and ion beam energy and so on. Experimental demonstration will be presented with predefined free surface as well as fundamental structures. The proposed method can be applied to any material in principle when the sputtering yield and redeposition flux distribution are known.
机译:本文介绍了一种实现亚微米级的精确表面雕刻的方法。该方法基于众所周知的表面传播理论,即表面根据惠更斯理论移动其表面法线方向。可以控制诸如入射离子束通量和再沉积通量的表面驱动力,使得在每个预切割层的位置处控制表面驱动速度。这样,可以在适当条件下制造任何表面。像素重叠,停留时间和离子束能量等。实验演示将以预定义的自由表面以及基本结构呈现。当已知溅射产率和再沉积通量分布时,所提出的方法原则上可以应用于任何材料。

著录项

  • 来源
    《Microelectronic Engineering》 |2012年第3期|p.14-18|共5页
  • 作者

    Heung-Bae Kim;

  • 作者单位

    Korea Institute of Industrial Technology (KITECH), 35-3 Hongcheon-ri, Ipjang-myeong, Chungcheongnam-do 330-825, Republic of Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    focused ion beam; microfabrication; redeposition;

    机译:聚焦离子束微细加工;再沉积;

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