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Photo-sculpting technology for the fabrication of complex surfaces for micro-optic and micro-engineering applications

机译:用于微光学和微工程应用的复杂表面制造的照相雕刻技术

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Summary form only given. The authors describe a generic technology which can enable the fabrication of surface relief structures of great complexity. The initial work was aimed at providing micro-optic lens plates for improving the performance of infrared detectors. For improved optical efficiency, the need arose for high fill factor lens with aspheric surfaces and eventually for combined refractive-diffractive lens. It was necessary then to develop a completely new process. The new process was based on the observation that positive photoresist exposes progressively through the thickness of the film on increasing illumination with UV. The authors' work has been directed at developing an exposure technique which allows a carefully controlled exposure dose at each point in the film. In this way the pattern of light intensities is transformed into vertical relief in the photoresist.
机译:仅提供摘要表格。作者描述了一种通用技术,该技术可以制造出非常复杂的表面起伏结构。最初的工作旨在提供微光学透镜板,以改善红外探测器的性能。为了提高光学效率,需要具有非球面表面的高填充因数透镜,并最终需要组合的折射-衍射透镜。然后有必要开发一个全新的过程。新工艺基于以下观察结果:在增加紫外线照射下,正性光致抗蚀剂通过膜的厚度逐渐曝光。作者的工作旨在开发一种曝光技术,该技术允许在胶片的每个点上谨慎控制曝光剂量。以这种方式,光强度的图案在光刻胶中转变为垂直浮雕。

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