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Fabrication of adjacent micropillar arrays with different heights for cell studies

机译:制作不同高度的相邻微柱阵列用于细胞研究

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摘要

We fabricated adjacent micropillar arrays with different heights using different materials. Masters are obtained by using a two-step photolithography technique. A thin layer of SU8-3005 resist was spin coated on a chromium mask, followed by a front side exposure with another assistance mask, resulting in a step resist profile. Then, a thin layer of SU8-3010 resist was spin-coated again on the mask, followed by a back side exposure. The master patterns which consist of adjacent pillar arrays of different heights were replicated into polydimethylsiloxane (PDMS) by soft lithography. The PDMS replicas were then used as molds for casting or hot embossing, resulted in final pillars arrays in PDMS, poly lactic-co-glycolic acid (PLGA) and flexestene thermoplastic elastomer. Such substrates made of different materials were used to evaluate the surface stiffness dependent cell migration of NIH 313 cells. Our results show that the cells were sensitive to the height of PDMS pillars, due to their comparable Young's module, and that the cells were preferentially localized on the stiffer surfaces. However, no such effect was observed when the cells were placed on the PLGA substrate because of the excessive rigidity of the PLGA pillars. (C) 2016 Elsevier B.V. All rights reserved.
机译:我们使用不同的材料制作了具有不同高度的相邻微柱阵列。通过使用两步光刻技术获得母版。将SU8-3005抗蚀剂薄层旋涂在铬掩模上,然后用另一种辅助掩模进行正面曝光,从而形成阶梯状抗蚀剂轮廓。然后,将SU8-3010抗蚀剂薄层再次旋涂在掩模上,然后进行背面曝光。通过软光刻将包含不同高度的相邻柱阵列的主图案复制到聚二甲基硅氧烷(PDMS)中。然后将PDMS复制品用作铸模或热压花模具,从而在PDMS,聚乳酸-乙醇酸(PLGA)和弹性体热塑性弹性体中形成最终的支柱阵列。这种由不同材料制成的基底被用于评估NIH 313细胞的表面硬度依赖性细胞迁移。我们的结果表明,由于其可比的杨氏模量,这些单元格对PDMS支柱的高度敏感,并且这些单元格优先定位在较硬的表面上。然而,当将电池放置在PLGA基板上时,由于PLGA支柱的过度刚性,没有观察到这种效果。 (C)2016 Elsevier B.V.保留所有权利。

著录项

  • 来源
    《Microelectronic Engineering》 |2016年第6期|22-25|共4页
  • 作者单位

    Univ Paris 06, Univ Paris 04, Dept Chim, Ecole Normale Super,PSL Res Univ,CNRS UMR PASTEUR, F-75005 Paris, France;

    Univ Paris 06, Univ Paris 04, Dept Chim, Ecole Normale Super,PSL Res Univ,CNRS UMR PASTEUR, F-75005 Paris, France;

    Univ Paris 06, Univ Paris 04, Dept Chim, Ecole Normale Super,PSL Res Univ,CNRS UMR PASTEUR, F-75005 Paris, France;

    Univ Paris 06, Univ Paris 04, Dept Chim, Ecole Normale Super,PSL Res Univ,CNRS UMR PASTEUR, F-75005 Paris, France;

    Univ Paris 06, Univ Paris 04, Dept Chim, Ecole Normale Super,PSL Res Univ,CNRS UMR PASTEUR, F-75005 Paris, France;

    CNRS, UPR 20, Lab Photon & Nanostruct, F-91460 Marcoussis, France;

    Univ Paris Diderot, Inst Jacques Monod, UMR7592, CNRS, F-75013 Paris, France;

    Univ Paris 06, Univ Paris 04, Dept Chim, Ecole Normale Super,PSL Res Univ,CNRS UMR PASTEUR, F-75005 Paris, France|Kyoto Univ, Inst Integrated Cell Mat Sci, Kyoto 6068507, Japan|Jianghan Univ, Inst Interdisciplinary Res, Wuhan 430056, Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Micro pillars array; Cell culture; Cell-materials interaction;

    机译:微柱阵列细胞培养细胞与材料的相互作用;

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