首页> 外国专利> Memory arrays where a distance between adjacent memory cells at one end of a substantially vertical portion is greater than a distance between adjacent memory cells at an opposing end of the substantially vertical portion and formation thereof

Memory arrays where a distance between adjacent memory cells at one end of a substantially vertical portion is greater than a distance between adjacent memory cells at an opposing end of the substantially vertical portion and formation thereof

机译:在基本垂直部分的一端的相邻存储单元之间的距离大于在基本垂直部分的相对端的相邻存储单元之间的距离及其形成的存储阵列

摘要

Memory arrays and their formation are disclosed. One such memory array has a string of series-coupled memory cells with a substantially vertical portion. A distance between adjacent memory cells at one end of the substantially vertical portion is greater than a distance between adjacent memory cells at an opposing end of the substantially vertical portion. For other embodiments, thicknesses of respective control gates of the memory cells and/or thicknesses of the dielectrics between successively adjacent control gates may increase as the distances of the respective control gates/dielectrics from the opposing end of the substantially vertical portion increase.
机译:公开了存储器阵列及其形成。一个这样的存储器阵列具有一串串联耦合的存储器单元,其具有基本上垂直的部分。在基本竖直部分的一端的相邻存储单元之间的距离大于在基本竖直部分的相对端的相邻存储单元之间的距离。对于其他实施例,存储单元的各个控制栅极的厚度和/或相继相邻的控制栅极之间的电介质的厚度可以随着各个控制栅极/电介质到基本垂直部分的相对端的距离的增加而增加。

著录项

  • 公开/公告号US8951865B2

    专利类型

  • 公开/公告日2015-02-10

    原文格式PDF

  • 申请/专利权人 MICRON TECHNOLOGY INC.;

    申请/专利号US201313746578

  • 发明设计人 AKIRA GODA;

    申请日2013-01-22

  • 分类号H01L21/336;H01L29/66;H01L27/115;H01L29/788;H01L29/792;

  • 国家 US

  • 入库时间 2022-08-21 15:16:46

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